Calculator Inputs
Enter preset or manual rate constants. The calculator solves final thickness using the Deal-Grove oxidation relation.
Example Data Table
| Case | Ambient | Temp (°C) | Time | Initial Oxide (nm) | Final Oxide (nm) | New Growth (nm) |
|---|---|---|---|---|---|---|
| Screening Run A | Dry oxygen | 1000 | 60 min | 20 | 80.500 | 60.500 |
| Screening Run B | Wet steam | 1000 | 30 min | 10 | 140.486 | 130.486 |
| Screening Run C | Dry oxygen | 1100 | 120 min | 50 | 227.132 | 177.132 |
Formula Used
The calculator uses the Deal-Grove thermal oxidation model for silicon process estimation.
x is final oxide thickness, A is the linear parameter, B is the parabolic rate constant, t is oxidation time, and τ accounts for the starting oxide.
The page applies pressure, orientation, and process multipliers to both rate constants. That gives a quick sensitivity study without rewriting the core equation.
How to Use This Calculator
Choose preset mode for fast estimating or manual mode for calibrated constants.
Select dry oxygen or wet steam, then enter furnace temperature.
Enter oxidation time and choose minutes or hours.
Add the initial oxide thickness if a pre-existing film is present.
Adjust pressure, orientation, and process multipliers when your process needs correction factors.
In manual mode, provide B and B/A using µm²/hr and µm/hr.
Press the calculate button to show results above the form.
Use the graph to inspect growth versus time, then export the results summary as CSV or PDF.
FAQs
1. What does this calculator estimate?
It estimates final thermal oxide thickness and newly grown oxide using a Deal-Grove growth model. It also reports rate constants, average growth rate, equivalent time shift, and the likely growth regime.
2. When should I use preset mode?
Use preset mode during quick feasibility checks, early process comparisons, or classroom exercises. It is useful when you need a reasonable engineering estimate before inserting recipe-specific constants from measured fab data.
3. When is manual mode better?
Manual mode is better when your line already has validated oxidation constants. It lets you match the calculator to measured furnace behavior, special chemistry, pressure conditions, and internal process correction practices.
4. Why is wet oxidation much faster?
Wet oxidation usually has a higher reaction rate and a larger parabolic constant than dry oxidation. That increases thickness growth quickly, especially when time or temperature rises.
5. What is the meaning of the time-shift term τ?
τ represents the equivalent earlier oxidation time associated with the starting oxide. It prevents the model from pretending the wafer always begins at zero thickness, which improves continuity for pre-oxidized surfaces.
6. Are the preset constants exact?
No. They are practical engineering defaults for screening calculations. Real furnaces, wafer orientation, pressure, chlorine additives, loading effects, and measurement methods can shift the best-fit constants noticeably.
7. What does the growth regime label show?
The label indicates whether the solution is more linear-dominant, transitional, or parabolic-dominant. It helps you understand whether interface reaction or diffusion effects appear to control the modeled thickness outcome.
8. Can I use this for process signoff?
Use it for planning, comparison, and first-pass estimation. For signoff, confirm the constants with metrology data, validated furnace recipes, and your organization’s process control limits.